简介：采用沉淀和水热合成方法制备还原氧化石墨烯负载氧化钴纳米催化剂.采用XRD、Raman光源、SEM、TEM、氮气吸附、UV-Vis、XPS和H2-TPR等测试手段对所合成的催化剂进行表征.结果表明：颗粒尺寸均一的钴氧化物纳米颗粒均匀地分散在还原氧化石墨烯表面,所合成的材料具有较大的比表面积和均一的孔径分布.采用连续流动固定床微反-色谱装置对所合成的杂化催化剂对一氧化碳氧化的催化性能进行研究后发现,含还原氧化石墨烯质量分数为30%的催化剂具有最高的催化活性,能实现一氧化碳在100℃时的完全氧化.

简介：SY509-3-36[篇名]Corrosionbehaviorandstructureofstainlesssteelsafterlowtemperaturenitriding；SY509-3-37[篇名]CrystalfieldinhydrogenatedandnitrogenatedSmFe{sub}1ITicompound……

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简介：AnomalousLeakageCurrentinSilicon0xynitrideThinFilmsGrownbyMicrowaveExcitedNitrogenPlasmaNitridation.Applicationoftheexplosivemethodforcreatingnitrogenlayers；Brightplasmanitridingofferriticsteelwithseveralalloyingelements；Cleaningasthemostimportantsteptowardssuccessfulheattreatment

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简介：[篇名]ActivatedMigrationSintering，[篇名]Activationofsteelsurfacesbyoxynitriding，[篇名]Activescreenplasmanitridingtechnology，[篇名]AdvancedPlasmaNitridingforAluminumandAluminumAlloys，[篇名]Ananti-corrosionandwear-resistingcompoundingnitridedlayeronprecisepressedpartsofsoftsteels，[篇名]Anexperimentalstudytocorrelatewaterjetimpingementerosionresistanceandpropertiesofmetallicmaterialsandcoatings，[篇名]AnInfluenceofSonBombardingontheEffectsofNitridinginD.C.GlowDischargePlasma。

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简介：本文介绍了球形二氧化硅的特点和常见生产工艺,并以近十年来国内球形二氧化硅在覆铜板中应用专利为研究对象,综述了球形二氧化硅在覆铜板中的使用情况,并对球形二氧化硅填料在覆铜板中应用的未来趋势提出了见解。

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简介：CharacteristicsofsiliconoxynitridesmadebyECRplasmas；CharacterizationandcomparisonofPECVDsiliconnitrideandsiliconoxynitridedielectricforMIMcapacitors；CharacterizationofsiliconoxynitridethinfilmsdepositedbyECR-PECVD；Characterizationofsiliconoxynitridesandhigh-kdielectricmaterialsbyangle-resolvedX-rayphotoelectronspectroscopy

简介：[篇名]3-inchfull-colorOLEDdisplayusingaplasticsubstrate,[篇名]AsignificantimprovementinmemoryretentionofMFISstructurefor1T-typeferroelectricmemorybyrapidthermalannealing,[篇名]Accuratereliabilityevaluationofnon-uniformultrathinoxynitridcandhigh-klayers,[篇名]Advancedgatedielectricmaterialsforsub-100nmCMOS,[篇名]AINfilmscpitaxialyformedbydirectnitridationofsapphireusingaluminumoxynitridcasabufferlayer,[篇名]Amorphoussilicon-oxynitridcsubmicronfibres,[篇名]CharacteristicsofCr-Al-N-Othinfilmspreparedbypulsedlaserdeposition.

简介：Characterisationandapplicationoftitaniumcarbonitride-basedcuttingtools；Compositeceramicsandcoatingsfortribotechnicalapplication；Crystallizationofpolymer-derivedsiliconcarbonitrideat1873Kundernitrogenoverpressure；1Effectofcoolingconditionsonplasma-carbonitridedironsurfaces

简介：SY509-3-64[篇名]DegradationandSILCeffectsofRPECVDsub-2.0nmoxide/nitrideandoxynitridedielectricsunderconstantcurrentstress；SY509-3-65[篇名]EffectofMicrostructuralVariablesontheErosionofSiliconNitrideCeramics……

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简介：SY509-3-50[篇名]Effectofnicotridingconditionsontheoperatingpropertiesofsteels；SY509-3-51[篇名]Enhancedcarburizingusinganovelaccelerant；……

简介：[篇名]Astudyonfrictionandwearbehaviourofcarburized,carbonitridedandboridedAISI1020and5115steels,[篇名]AlloyCarburizationatTemperaturesof1,200-2,100F(650-1,150℃),[篇名]Amorphoussiliconcarbonitridefibersdrawnfromalkoxidemodifiedceraser,[篇名]Bearingswithincrcasedreliability,[篇名]Brightoutlookforhardcoatings,[篇名]Carbonitridccoatingbylow-temperaturediffusionprocess,[篇名]Carbonitridcnanomaterials,thinfilms,andsolids.

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