Image lithography in telluride suboxide thin film through controlling “virtual” bandgap

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摘要 Inthiswork,TeO0.7thinfilmswerepreparedbythereactivemagnetron-controllingsputteringmethod.Complexgray-scalepatternsweresuccessfullyfabricatedonTeO0.7thinfilmsthroughthelaserdirectwritingmethod.ThestructuraloriginofTeO0.7thinfilmwasinvestigatedforgray-scalepatternformation.Itisfoundthatmultiplegray-scalelevelsaredependentonthe'virtual'bandgapenergyofTeO0.7thinfilms.Thebandgapenergychangesleadtorefractiveindexandreflectivitydifference.Thus,gray-scaletonescanbeformed.Byaccuratelycontrollinglaserenergy,various'virtual'bandgapscanbegeneratedinTeO0.7thinfilms,andcolorfulgray-scalelevelscanbeformed.ExperimentalresultsindicatethatTeO0.7thinfilmcanbeusedasmicro/nanoimagewritingmaterial.
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出版日期 2017年01月11日(中国期刊网平台首次上网日期,不代表论文的发表时间)
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