AnanalysistechniquecombiningRBSwithPIXEtechnologybyx-particlesincidentbeamwasconstructedandappliedtoanalyselightimpuritiesinheaviersubstrates.ItcanruninmeasuringRutherfordbackscatteringandX-rayspectrainrandomandchannelingmode,simultaneously.Beingusedtoanalysesulphuratomsim-plantedintoGaAssinglecrystals,thismethodisrelativelysimpleandquick-operating.Itisespeciallyusefulforanalysinglightimpuritiesinsemiconductorcompounds,optoelectronicandmicrowavematerials.
