学科分类
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1 个结果
  • 简介:ThediamondfilmsadherenttoSisubstratearedepositedwiththemicrowaveplasmaCVD(MPCVD)atmicrowavepowersof6000Wand4000Wfrom6hto10h,respectively,theinternalstressesofthefilmsaremeasuredbyXRD.Spectralpeakshiftandwideningareappliedtocalculatethemagnitudesofmacroandmicrostresses.Theresultsshowthatthemacrostressistensile.Theinternalstresscanbecontrolledbythemicrowavepower.Withthemicrowavepowerincreasing,theintrinsicandmacrostressesdecrease,andthemicrostressincreasessignificantly.Also,itcanbefoundthatthemacroandmicrostressesincreasewithdepositedtimewhentheotherconditionsarethesame.

  • 标签: X射线衍射测量 金刚石薄膜 化学汽相沉积 微波等离子体化学气相沉积法 硅衬底 内应力