PolycrystallineZnOfilmswerepreparedonglasswaferusingZntargetsbyradiofrequency(RF)reactivesputteringtechniqueunderdifferentdepositionconditions.X-raydiffraction(XRD)andopticaltransmittancespectrumwereemployedtoanalyzethestructureandopticalcharacterofthefilms.Thestrainandstressinfilms,aswellasthepackingdensityarecalculatedintermsofrefractiveindexoffilmsmeasuredwithanellipticpolarizationanalyzer.ItisthedepositionconditionsthathavegreateffectsonthestructuralandopticalpropertiesofZnOfilms.Undertheoptimalconditions,theonlyevidentpeakinXRDspectrumwas(002)peakwiththefullwidthathalfmaximum(FWHM)of0.20°showingthegrainsizeof42.8nm.Thepackingdensity,thestressin(002)planeandtheaverageopticaltransmittanceinthevisibleregionwereabout97%,-1.06×109N/m2and92%,respectively.
